Dominick Pipitone

Dominick Pipitone is a technical staff member in the Advanced Materials and Microsystems Group at MIT Lincoln Laboratory. His current research is focused on optimizing the performance of fully depleted silicon-on-insulator (FDSOI) CMOS process technology in special environments, including high radiation or cryogenic temperatures.

Prior to joining the Laboratory, Pipitone worked at Intel for 20 years, focusing on CMOS transistor performance and yield advancements across many technology nodes, as well as design and characterization of test structures, and coordination of technology transfer from development to high-volume manufacturing. While at Intel, he also demonstrated on-chip magnetic strip-line inductors integrated with power management integrated circuits, and worked on gallium nitride-on-silicon high-electron-mobility power transistors.

Pipitone received his BE degree in electrical engineering from the State University of New York Maritime College and MS degree in electrical engineering from the University of South Florida. His graduate student research focused on low-temperature silicon dioxide growth with remote plasma systems.