Don Boroson and Theodore Fedynyshyn named Fellows of SPIE

Dr. Don M. Boroson, leader of the Optical Communications Technology Group at MIT Lincoln Laboratory, and Dr. Theodore H. Fedynyshyn, senior staff member in the Chemical Sensing and Synthetic Materials Group, were named 2012 Fellows of SPIE.

Photo of Don BorosonBoroson was recognized for "achievements in satellite laser communications." At Lincoln Laboratory, he has contributed to several advanced satellite communications system designs, developing digital beamforming algorithms, efficient receiver architectures, and novel modulation formats. He coordinated the integration and test planning for the Laser Intersatellite Transmission Experiment, and served as team leader for the development of the next several generations of optical space terminals. Boroson was the lead engineer and associate manager for the GeoLITE program, coordinating the creation of the complete system architecture and collaborating on the design of subsystems in this space-to-ground laser communication (lasercom) system, which, in 2001, became the world’s first successful space-based, high-rate lasercom system. He then served as lead system engineer on the NASA-sponsored Mars Laser Communication Demonstration study team, and his group is now designing and building both space and ground terminals for the ongoing Lunar Laser Communications Demonstration program. As leader of the Optical Communications Technology Group, he continues to oversee programs that push the state of the art in free-space lasercom. Boroson has participated in many government and cross-Laboratory system studies, and holds BSE, MSE, MA, and PhD degrees in electrical engineering from Princeton University.

Photo of Theodore FedynyshynFedynyshyn was recognized for "achievements in photoresist materials and process technology." During his more than ten years at Lincoln Laboratory, he has been responsible for building a new technical capability in the field of synthetic chemistry; initiated a synthetic chemical research group; and designed, built, funded, and equipped a new synthesis and analytical chemical laboratory. He is leading the Laboratory's synthetic chemistry research programs in both resist and other nonoptical technical areas. A world-recognized leader in the field of resists for microlithography, Fedynyshyn has published seminal papers on resist theory and performance that have formed the basis for all modern lithographic simulation. He has published 94 technical papers primarily in the area of lithography and holds 19 U.S. patents. He has chaired international conferences on lithography and photopolymers and is the head of the resist section of the Semiconductor Industry Association Technical Working Group responsible for developing the International Technology Roadmap for Semiconductors. He holds a BS degree in chemistry from Lehigh University, an MBA degree from the University of New Haven, and a PhD degree in organic chemistry from Brown University.

SPIE is an international society dedicated to advancing light-based technologies. Founded in 1955 as the Society of Photographic Instrumentation Engineers, SPIE has evolved to reflect the expanding field of optics and photonics. Today, approximately 180,000 members from more than 170 countries contribute to SPIE's scientific mission. The society annually sponsors about 25 technical forums and programs, and maintains the SPIE Digital Library of more than 325,000 research papers drawn from SPIE's conference proceedings and its nine scholarly journals.

Posted March 2012

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