Mordechai Rothschild receives 2014 Frits Zernike Award for Microlithography
Dr. Mordechai Rothschild, leader of the Chemical, Microsystem, and Nanoscale Technologies Group at MIT Lincoln Laboratory, was named the 2014 recipient of the SPIE Frits Zernike Award for Microlithography. The award, annually presented for significant accomplishments in lithographic technology, recognizes Dr. Rothschild's "contributions made to the advancement of lithography through exploration and demonstration of DUV/VUV [deep ultraviolet/vacuum ultraviolet] materials, lasers, and systems."
Since joining Lincoln Laboratory in 1984, Dr. Rothschild has served as a technical staff member, assistant group leader, and group leader in the Submicrometer Technology Group. He has been involved in the development of advanced optical lithography technologies, leading much of the Laboratory's seminal work in 193 nm lithography, with an emphasis on improving the performance of optical materials, optical coatings, and pellicles. Under his leadership, Lincoln Laboratory has become a de facto national center of excellence in optical lithography.
Working with industry partners, Dr. Rothschild has also led efforts to extend lithographic techniques to smaller dimensions than those possible with 193 nm, and has explored how to improve the resolution of optical lithography through liquid immersion at 157 and 193 nm. Liquid immersion lithography at 193 nm has been embraced by the industry, and today the majority of advanced semiconductor lithography worldwide utilizes 193 nm, and the most advanced technologies employ liquid immersion as well. Currently, Dr. Rothschild directs programs in metamaterials, plasmonics, microfluidics, and microoptics.
Dr. Rothschild is a member of the Lithography Working Group of the International Technology Roadmap for Semiconductors; the Board of the Lithography Workshops; the program committee of the International Conferences on Electron, Ion, and Photon Beam Technology and Nanofabrication; and the international program committee of the Micro and Nano Engineering Conferences. He is author or co-author of more than 180 publications and co-inventor on 13 patents. Prior to joining Lincoln Laboratory, he worked at the University of Illinois–Chicago and the University of Southern California. He holds a BS degree (summa cum laude) in physics from Bar Ilan University in Israel and a PhD degree in optics from the University of Rochester.
On 24 February, Dr. Rothschild accepted his award at SPIE's Advanced Lithography conference. SPIE, an international society dedicated to advancing light-based technologies, was founded in 1955 as the Society of Photographic Instrumentation Engineers. Today, SPIE has 180,000 members from approximately 155 countries. The society annually sponsors about 25 technical forums and programs, and maintains the SPIE Digital Library of more than 375,000 research papers drawn from its conference proceedings and nine scholarly journals.
Posted March 2014
top of page