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Wafer-scale aluminum nanoplasmonic resonators with optimized metal deposition

Published in:
ACS Photonics, Vol. 3, No. 5, 18 May 2016, pp. 796-805.

Summary

Spectroscopic ellipsometry is demonstrated to be an effective technique for assessing the quality of plasmonic resonances within aluminum nanostructures deposited with multiple techniques. The resonance quality of nanoplasmonic aluminum arrays is shown to be strongly dependent on the method of aluminum deposition. Three-layer metal-dielectric-metal nanopillar arrays were fabricated in a complementary metal-oxide semiconductor (CMOS) facility, with the arrays of nanopillars separated from a continuous metal underlayer by a thin dielectric spacer, to provide optimum field enhancement. Nanostructures patterned in optimized aluminum, which had been deposited with a high temperature sputtering process followed by chemical mechanical planarization, display different resonance and depolarization behavior than nanostructures deposited by the more conventional evaporation process. Full plasmonic band diagrams are mapped over a wide range of incidence angles and wavelengths using spectroscopic ellipsometry, and compared for aluminum nanostructures fabricated with two methods. The resonators fabricated from optimized aluminum exhibit a narrower bandwidth of both plasmonic resonance and depolarization parameters, indicating a higher quality resonance due to a stronger localization of the electric field. The optimized wafer-scale aluminum plasmonics fabrication should provide a pathway towards better quality devices for sensing and light detection in the ultraviolet and blue parts of the spectrum.
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Summary

Spectroscopic ellipsometry is demonstrated to be an effective technique for assessing the quality of plasmonic resonances within aluminum nanostructures deposited with multiple techniques. The resonance quality of nanoplasmonic aluminum arrays is shown to be strongly dependent on the method of aluminum deposition. Three-layer metal-dielectric-metal nanopillar arrays were fabricated in a...

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Nanochannel fabrication based on double patterning with hydrogen silsesquioxane

Published in:
J. Vac. Sci. Technol. B, Microelectron. Process. Phenon., Vol. 33, No. 2, March 2015, 020601.

Summary

A double patterning process is presented to pattern sub-35 nm wide channels in hydrogen silsesquioxane with near 100% pattern densities. Using aligned electron beam lithography, each side of the nanochannel structure is patterned as a separate layer. A 50000 uC/cm^2 high-dose anneal is applied to the first layer after exposure. Channels with widths below ~60 nm are shown to exhibit footing with standard tetramethyl ammonium hydroxide developers. This problem is resolved by adding surfectant during the development of the final channel structure. The resulting process produced channels
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Summary

A double patterning process is presented to pattern sub-35 nm wide channels in hydrogen silsesquioxane with near 100% pattern densities. Using aligned electron beam lithography, each side of the nanochannel structure is patterned as a separate layer. A 50000 uC/cm^2 high-dose anneal is applied to the first layer after exposure...

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Engineered liquid crystal anchoring energies with nanopatterned surfaces

Published in:
Opt. Express, Vol. 23, No. 2, 26 January 2015, pp. 807-14.

Summary

The anchoring energy of liquid crystals was shown to be tunable by surface nanopatterning of periodic lines and spaces. Both the pitch and height were varied using hydrogen silsesquioxane negative tone electron beam resist, providing for flexibility in magnitude and spatial distribution of the anchoring energy. Using twisted nematic liquid crystal cells, it was shown that this energy is tunable over an order of magnitude. These results agree with a literature model which predicts the anchoring energy of sinusoidal grooves.
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Summary

The anchoring energy of liquid crystals was shown to be tunable by surface nanopatterning of periodic lines and spaces. Both the pitch and height were varied using hydrogen silsesquioxane negative tone electron beam resist, providing for flexibility in magnitude and spatial distribution of the anchoring energy. Using twisted nematic liquid...

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