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Nanocomposite approaches toward pellicles for 157-nm lithography

January 1, 2005
  |
Journal Article
Author:
Vladimir Liberman
…
Published in:
J. Microlith., Microfab., Microsyst., Vol. 4, No. 1, January-March 2005, pp. 013004-1 - 013004-6.
Topic:
lithography
R&D area:
R&D group:

Summary

Pellicle materials for use at 157 nm must display sufficient transparency at this wavelength and adequate lifetimes to be useful. We blended a leading candidate fluoropolymer with silica nanoparticles to examine the effect on both the transparency and lifetime of the pellicle. It is anticipated that these composite materials may increase the lifetime by perhaps quenching reactive species and/or by dilution, without severely decreasing the 157-nm transmission. Particles surface-modified with fluorinated moieties are also investigated. The additives are introduced as stable nanoparticle dispersions to casting solutions of the fluoropolymers. The properties of these solutions, films, and the radiationinduced darkening rates are reported. The latter are reduced in proportion to the dilution of the polymer, but there is no evidence that the nanoparticles act as radical scavengers.
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Summary

Pellicle materials for use at 157 nm must display sufficient transparency at this wavelength and adequate lifetimes to be useful. We blended a leading candidate fluoropolymer with silica nanoparticles to examine the effect on both the transparency and lifetime of the pellicle. It is anticipated that these composite materials may...

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Nanocomposite approaches toward pellicles for 157-nm lithography

Photoresist outgassing: a potential Achilles heel for short wavelength optical lithography?

February 22, 2004
  |
Conference Paper
Author:
Roderick R. Kunz
Published in:
SPIE Vol. 5376, Advances in Resist Technology and Processing XXI, 22-27 February 2004, pp. 1-15.
Topic:
optics
R&D area:
R&D group:

Summary

The outgassing of volatile organic compounds during photoresist exposure at short wavelengths (
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Summary

The outgassing of volatile organic compounds during photoresist exposure at short wavelengths (

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Photoresist outgassing: a potential Achilles heel for short wavelength optical lithography?

Marathon evaluation of optical materials for 157-nm lithography

January 1, 2003
  |
Journal Article
Author:
Vladimir Liberman
…
Published in:
J. Microlithogr., Microfab., Microsyst., Vol. 2, No. 1, January 2003, pp. 19-26.
Topic:
lithography
R&D area:
R&D group:

Summary

We present the methodology and recent results on the longterm evaluation of optical materials for 157-nm lithographic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in situlamp-based cleaning. We describe ultraclean marathon testing chambers that have been designed to decouple effects of intrinsic material degradation from extrinsic ambient effects. We review our experience with lithography-grade 157-nm lasers and detector durability. We review the current status of bulk materials for lenses, such as CaF(2) and BaF(2), and durability results of antireflectance coatings. Finally, we discuss the current state of laser durability of organic pellicles.
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Summary

We present the methodology and recent results on the longterm evaluation of optical materials for 157-nm lithographic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in situlamp-based cleaning. We describe ultraclean marathon...

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Marathon evaluation of optical materials for 157-nm lithography

Infrared frequency selective surfaces fabricated using optical lithography and phase-shift masks

May 29, 2001
  |
Conference Paper
Author:
Steven Jay Spector
…
Published in:
J. Vac. Sci. Technol. B, Vol. 19, No. 6, November/December 2001, pp. 2757-2760. (45th Int. Conf. on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN), 29 May-1 June 2001.)
Topic:
lithography
R&D area:
R&D group:

Summary

A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the band gap of the thermophotovoltaic cell while transmitting the usable light above the band gap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameter and width of the circular slits were 870 and 120 nm, respectively. The FSS was predicted to pass wavelengths near 7 um and reflect wavelengths outside of this pass band. The FSSs fabricated performed as expected with a pass band centered near 5 um.
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Summary

A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the band gap of the thermophotovoltaic cell while transmitting the usable light above the band gap. This behavior is relatively independent of the light's...

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Infrared frequency selective surfaces fabricated using optical lithography and phase-shift masks
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