Roderick R. Kunz

Dr. Roderick R. KunzDr. Roderick R. Kunz is assistant leader of the Chemical, Microsystem, and Nanoscale Technologies Group, where he currently leads programs on the signature science and detection of explosives and chemical threats. In addition to these activities, his broader interests span a range of chemical disciplines, including chemical detection, photochemistry, mass spectrometry, surface science, and polymer physics.

Prior to joining the Laboratory, he worked at the IBM T. J. Watson Research Center, where he studied the fundamental mechanisms of vapor-phase epitaxial silicon growth. During his first 15 years at Lincoln Laboratory, he worked on developing materials, processes, and exposure tools for deep-ultraviolet photolithography.

Dr. Kunz has published a total of 89 papers, 37 as first author, and is inventor or co-inventor on 11 issued patents. He has served on the organizational committees for several international conferences, and chaired both the SPIE Advances in Resist Technology and Processing XIII conference in 1996 and the 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication in 2002.

He received his PhD degree in chemistry from the University of North Carolina at Chapel Hill and his BS degree in chemistry from Rensselaer Polytechnic Institute.

 

 

 

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