Selected Publications

Topics:

Sensing

Phenomenology

(Publications available upon request.)

Detection

R. L. Aggarwal, L. W. Farrar, S. Di Cecca, and T. H. Jeys, Raman spectra and cross sections of ammonia, chlorine, hydrogen sulfide, phosgene, and sulfur dioxide toxic gases in the fingerprint region 400-1400 cm-1, AIP Advances 6, 025310, 2016.

Jude A. Kelley, Alla Ostrinskaya, Geoff Geurtsen and Roderick R. Kunz, Reagent approaches for improved detection of chlorate and perchlorate salts via thermal desorption and ionization, Rapid Communication Mass Spectrometry 30, pp. 191-198, 2016.

Alexander M. Stolyarov, Ryan M. Sullenberger, David R. Crompton, Thomas H. Jeys, Brian G. Saar, and William D. Herzog, Photothermal speckle modulation for noncontact materials characterization, Optical Leters, Vol. 40, No. 24, pp. 5786-5789, 2015.

Vladimir Liberman, Kimberly Hamad-Schifferli, Todd A. Thorsen, Scott T. Wick and Peter A. Carr, In situ microfluidic SERS assay for monitoring enzymatic breakdown of organophosphates, Nanoscale 7, 11013-11023, 2015.

R. L. Aggarwal, S. Di Cecca, L. W. Farrar, A. Shabshelowitz, and T. H. Jeys, Sensitive Detection and Identification of Isovanillin Aerosol Particles at the pg/cm3 Mass Concentration Level Using Raman Spectroscopy, Aerosol Science and Technology 49, 753–756, 2015.

C. Wynn, S. Palmacci, M.L. Clark, and R.R. Kunz, High-Sensitivity Detection Of Trace Gases Using Dynamic Photoacoustic Spectroscopy, Optical Engineering, vol. 53, no. 2, pp. 021103 - 021103-5, February 2014.

R. M. Sullenberger, M. L. Clark, R. R. Kunz, A. C. Samuels, D. K. Emge, M.W. Ellzy, and C. M. Wynn, Trace aerosol detection and identification by dynamic photoacoustic spectroscopy, Optics Express, vol. 22, issue S7, pp. A1810-A1817, 2014.

R. L. Aggarwal, S. Di Cecca, L. W. Farrar and T. H. Jeys,  Chemical aerosol detection and identification using Raman scattering Journal of Raman Spectroscopy  45, 677–679, 2014.

K.E. Gregory, A. Ostrinskaya, and R.R. Kunz, Reagent Assessment For Detection Of Ammonium Ion-Molecule Complexes, Rapid Communications in Mass Spectrometry, vol. 27, issue 24, pp. 2797-2806, December 2013.

R.L. Aggarwal, L.W. Farrar, N.G. Greeneltch, R.P. VanDuyne, and D.L. Polla, Measurement of the Surface-Enhanced Coherent Anti-Stokes Raman Scattering (SECARS) due to the 1574 cm-1 Surface-Enhanced Raman Scattering (SERS) Mode of Benzenethiol Using Low-power (<20 mW) CW Diode Lasers, Applied Spectroscopy, vol. 67, no. 2, pp. 132-135, 2013.

C.M. Wynn, S. Palmacci, M.L. Clark, and R.R. Kunz, Dynamic Photoacoustic Spectroscopy For Trace Gas Detection, Applied Physics Letters, vol. 101, pp. 184103 - 184103-4, 2012.

R.L. Aggarwal, L.W. Farrar, J. Parkhill, A. Aspuru-Guzik, and D.L. Polla, Measurement of the Third-order Nonlinear Optical Susceptibility Χ(3) for the 1002-cm-1 Mode of Benzenethiol Using Coherent Anti-Stokes Raman Scattering with Continuous-wave Diode Lasers, Journal of Raman Spectroscopy vol. 43, pp. 911–916, November 2011.

C.M. Wynn, S. Palmacci, R.R. Kunz, and M. Rothschild, Noncontact Optical Detection Of Explosive Particles Via Photodissociation Followed By Laser-Induced Fluorescence, Optics Express, vol. 19, pp. 18671-18677, 2011.

C. Wynn, S. Palmacci, R.R. Kunz, and M. Aernecke, Noncontact Optical Detection Of Explosive Particles Via Photodissociation Followed By Laser-Induced Fluorescence, Optics Express, vol. 19, pp. 18673-18677, 2011.

M. Switkes, B.L. Ervin, R.P. Kingsborough, M. Rothschild, and M. Sworin, Retroreflectors For Remote Readout Of Colorimetric Sensors, Sensors and Actuators B-Chemical, vol. 160, issue 1, pp. 1244-1249, December 2011.

R.L. Aggarwal, L.W. Farrar, and D.L. Polla, Measurement of the Absolute Raman Scattering Cross Sections of Sulfur and the Standoff Raman Detection of a 6-mm-thick Sulfur Specimen at 1500 m, Journal of Raman Spectroscopy, vol. 42, issue 3, pp. 461-464, 2011.

C. Wynn, S. Palmacci, R. Kunz, and M. Rothschild, Noncontact Detection Of Homemade Explosive Constituents Via Photodissociation Followed By Laser-Induced Fluorescence, Optics Express, vol. 18, issue 6, pp. 5399-5406, 2010.

R.R. Kunz, K.E. Gregory, D.E. Hardy et al., Measurement Of Trace Explosive Residues In A Surrogate Operational Environment: Implications For Tactical Use Of Chemical Sensing In C-IED Operations, Analytical and Bioanalytical Chemistry, 395(2), pp. 357-369, 2009.

C. Wynn, S. Palmacci, R. Kunz, K. Clow, and M. Rothschild, Detection Of Condensed-Phase Explosives Via Laser-Induced Vaporization, Photodissociation, And Resonant Excitation, Applied Optics, 47(31), pp. 5767-5776, 2008.

C.M. Wynn, S.T. Palmacci, R.R. Kunz, and M. Rothschild, A Novel Method For Remotely Detecting Trace Explosives, MIT Lincoln Laboratory Journal, vol. 17, no. 2, pp. 27-40, 2008.

C. Wynn, S. Palmacci, R. Kunz, J. Zayhowski, B. Edwards, and M. Rothschild, Experimental Demonstration Of Remote Optical Detection Of Trace Explosives, Proceedings of SPIE 6954, Chemical, Biological, Radiological, Nuclear, and Explosives (CBRNE) Sensing IX, p. 695407, 2008.

T.H. Jeys, W.D. Herzog, J.D. Hybl, R.N. Czerwinski, and A. Sanchez, Advanced Trigger Development, MIT Lincoln Laboratory Journal, vol. 17, no. 29, 2007.

W.D. Herzog, S.M. Tysk, D.W. Tardiff, G.G. Cappiello, J.M. Jong, T.H. Jeys, R.H. Hoffeld, A. Sanchez, and V. Daneu, Measurement of Aerosol-particle Trajectories Using a Structured LaserBeam, Applied Optics, vol. 46, pp. 3150-3155, 2007.

J. Hybl, S. Tysk, S. Berry, and M. Jordan, Laser-Induced Fluorescence-Cued, Laser-Induced Breakdown Spectroscopy Biological-Agent Detection, Applied Optics, vol. 45, pp. 8806-8814, 2006.

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Materials

Plasmonics and Metamaterials

Vladimir Liberman, Kenneth Diest, Corey W. Stull, Matthew T. Cook, Donna M. Lennon, Mordechai Rothschild, and Stefan Schoeche, Wafer-scale Aluminum Nanoplasmonic Resonators with Optimized Metal Deposition, ACS Photonics, pp. 796-805, 2016.

Vladimir Liberman, Kimberly Hamad-Schifferli, Todd A. Thorsen, Scott T. Wick and Peter A. Carr, In situ microfluidic SERS assay for monitoring enzymatic breakdown of organophosphates, Nanoscale 7, pp. 11013-11023, 2015.

Kenneth W. Allen, Navid Farahi, Yangcheng Li, Nicholaos I. Limberopoulos, Dennis E. Walker Jr, Augustine M. Urbas, Vladimir Liberman, and Vasily N. Astratov, Super-resolution microscopy by movable thin-films with embedded microspheres: resolution analysis, Annalen der Physik (Berlin) 527, No. 7–8, pp. 513–522, 2015.

T. Tumkur, Y. Barnakov, S. T. Kee, M. A. Noginov and V. Liberman, Permittivity evaluation of multilayered hyperbolic metamaterials: ellipsometry vs. reflectometry, Journal of Applied Physics 117, 103104, 2015.

V. Liberman, M. Sworin, R.P. Kingsborough, G.P. Geurtsen, and M. Rothschild, Nonlinear Bleaching, Absorption, And Scattering Of 532-nm-Irradiated Plasmonic Nanoparticles, Journal of Applied Physics, vol. 113, issue 5, pp. 053107-053107-10, February 2013.

V. Liberman, R. Adato, T.H. Jeys, B.G. Saar, S. Erramilli, and H. Altug, Rational Design And Optimization Of Plasmonic Nanoarrays For Surface Enhanced Infrared Spectroscopy, Optics Express, vol. 20, p. 11953, 2012.

V. Liberman, R. Adato, A. Mertiri, A.A. Yanik, C. Kai, T.H. Jeys, S. Erramilli, and H. Altug, Angle-And Polarization-Dependent Collective Excitation Of Plasmonic Nanoarrays For Surface Enhanced Infrared Spectroscopy, Optics Express, vol. 19, 11202, 2011.

V. Liberman, M. Rothschild, O. Bakr, and F. Stellacci, Optical Limiting With Complex Plasmonic Nanoparticles, Journal of Optics, vol. 12, 065001, 2010.

V. Liberman, C. Yimaz, T. Bloomstein, S. Somu, Y. Echegoyen, A. Busnaina, and M. Rothschild, A Nanoparticle Convective Directed Assembly Process For The Fabrication Of Periodic Surface Enhanced Raman Spectroscopy Substrates, Advanced Materials, vol. 22, 4298, 2010.

Two-dimensional Materials

J. Kedzierski, P-L. Hsu, A. Reina, J. Kong, P. Healey, P. Wyatt, and C. Keast, Graphene On Insulator Transistors Made using C on Ni Chemical Vapor Deposition, IEEE Transactions on Electron Devices, vol. 30, issue 7, pp. 745-747, 2009.

J. Kedzierski, P.-L. Hsu, P. Wyatt, P. Healey, C. Keast, W. de Heer, and C. Berger, Epitaxial Graphene Transistors on SiC Substrates, IEEE Transactions on Electron Devices, vol. 55, issue 8, pp. 2078-2085, 2008.

Microelectronic Devices

Michael Lis, Maxwell Plaut, Andrew Zai, David Cipolle, John Russo, Jennifer Lewis, and Theodore Fedynyshyn, Polymer Dielectrics for 3D-Printed RF Devices in the Ka Band, Advanced Materials Technologies, 1600027, 2016.

C.J. Brennan, C.M. Neumann, S.A. Vitale, Comparison of Gate Dielectric Plasma Damage from Plasma-Enhanced Atomic Layer Deposited and Magnetron Sputtered TiN Metal Gates, Journal of Applied Physics 118, 045307, 2015.

S.A. Vitale, P.M. Gouker, Gadolinium oxide coated fully depleted silicon on insulator transistors for thermal neutron dosimetry, Nuclear Inst. and Methods in Physics Research A, 721:45, 2013.

S.A. Vitale, S. Berry, Etching Selectivity of Indium Tin Oxide to Photoresist in High Density Chlorine- and Ethylene- Containing Plasmas, J. Vac. Sci. Technol. B, 31:021210, 2013.

S.A. Vitale, P.W. Wyatt, N. Checka, J. Kedzierski, and C.L. Keast, FDSOI Process Technology for Subthreshold-Operation Ultra-Low-Power Electronics, ECS Transactions 35(5):179, 2011.

S. Vitale, J. Kedzierski, P. Healey, P. Wyatt, and C. Keast, Work-Function-Tuned TiN Metal Gate FDSOI Transistors For Subthreshold Operation, IEEE Transactions on Electron Devices, vol. 58, issue 2, pp. 419-426, 2011.

S.A. Vitale, P.W. Wyatt, N. Checka, J. Kedzierski, and C.L. Keast, FDSOI Process Technology for Subthreshold-Operation Ultra-Low-Power Electronics, Proceedings of the IEEE, 98(2):333, 2010.

S.A. Vitale, J. Kedzierski, and C.L. Keast, High Density Plasma Etching of Titanium Nitride Metal Gate Electrodes for FDSOI Subthreshold Transistor Integration, Journal of Vacuum Science and Technology B, 27(6): 2472, 2009.

M. Ieong, B. Doris, J. Kedzierski, K. Rim, and M. Yang, Silicon Device Scaling To The Sub-10-nm Regime, Science, vol. 306, no. 5704, pp. 2057-2060, 2004.

J. Kedzierski, E. Nowak, T. Kanarsky, Y. Zhang, D. Boyd, R. Carruthers, C. Cabral, R. Amos, C. Lavoie, R. Roy, J. Newbury, E. Sullivan, J. Benedict, P. Saunders, K. Wong, D. Canaperi, M. Krishnan, K.-L. Lee, B.A. Rainey, D. Fried, P. Cottrell, H.-S.P. Wong, M. Ieong, and W. Haensch, Metal-Gate FinFET And Fully-Depleted SOI Devices Using Total Gate Silicidation, International Electron Devices Meeting, pp. 247-250, 2002.

Y.C. Yeo, V. Subramanian, J. Kedzierski, P. Xuan, T.-J. King, J. Bokor and C. Hu, Design and Fabrication of 50-nm Thin-Body p-MOSFETs with a Silicon-Germanium Heterostructure Channel, IEEE Transactions on Electron Devices, vol. 49, issue 2, pp. 279-286, 2002.

D. Hisamoto, W.-C. Lee, J. Kedzierski, E. Anderson, T.-J. King, J. Bokor, and C. Hu, FinFET — A Self Aligned Double Gate MOSFET Scalable To 20 nm, IEEE Transactions on Electron Devices, vol. 47, no. 12, pp. 2320-2325, December 2000.

D. Hisamoto, W.-C. Lee, J. Kedzierski, E. Anderson, T.-J. King, J. Bokor, and C. Hu, A Folded-channel MOSFET for Deep Sub-tenth Micron Era, Proceedings of the Electron Devices Meeting, pp. 1032-1034, December 1998.

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Microfluidics

Shaun Berry, Carl O. Bozler, Life Senior Member, IEEE, Robert K. Reich, Harry R. Clark, Phillip Bos, Valerie Finnemeyer, and Colin McGinty, A Scalable Fabrication Process for Liquid Crystal-Based Uncooled Thermal Imagers, Journal of Microelectromechanical Systems, Vol. 25, No. 3, pp. 479-488, 2016.

Jakub Kedzierski, Kevin Meng, Todd Thorsen, Rafmag Cabrera, and Shaun Berry, Microhydraulic Electrowetting Actuators, Journal of Microlectromechnical Systems, Vol. 25, No. 2, pp. 394-400, 2016.

Vladimir Liberman, Kimberly Hamad-Schifferli, Todd A. Thorsen, Scott T. Wick and Peter A. Carr, In situ microfluidic SERS assay for monitoring enzymatic breakdown of organophosphates, Nanoscale 7, pp. 11013-11023, 2015.

S. Kumar, M.A. Cartas-Alaya, and T. Thorsen, Thermal Modeling And Design Analysis Of A Continuous Flow Microfluidic Chip, International Journal of Thermal Sciences, vol. 67, pp. 72-96, May 2013.

S. Berry, J. Stewart, T. Thorsen, and I. Guha, Development of Adaptive Liquid Microlenses And Microlens Arrays, Proceedings of SPIE, vol. 8816, 861610, 2013.

S. Berry, T. Fedynyshyn, L. Parameswaran, and A. Cabral, Switchable Electrowetting Of Droplets On Dual-Scale Structured Surfaces, Journal of Vacuum Science and Technology B, vol. 30, no. 6, 2012.

S. Berry, T. Fedynyshyn, L. Parameswaran, and A. Cabral, Reversible Electrowetting on Dual-Scale-Patterned Corrugated Microstructured Surfaces, Journal of Microelectromechanical Systems, vol. 21, issue 5, pp. 1261-1271, October 2012.

C.C. Huang, M. Bazant, and T. Thorsen, Ultrafast High-Pressure AC Electro-Osmotic Pumps For Portable Biomedical Microfluidics, Lab on a Chip, 10, 80, 2010.

J. Kedzierski, S. Berry, B. and Abedian, New Generation of Digital Microfluidic Devices, Journal of Microelectromechanical Systems, vol. 18, issue 4, pp. 845-851, 2009.

S. Berry, S. and J. Kedzierski, New Methods to Transport Fluids in Micro-Sized Devices, MIT Lincoln Laboratory Journal, vol. 17, no. 2, 2008.

S. Berry, J. Kedzierski, and B. Abedian, Irreversible Electrowetting on Thin Fluoropolymer Films, Langmuir, 23, pp. 12429-12435, 2007.

S. Berry, J. Kedzierski, and B. Abedian, Low Voltage Electrowetting Using Thin Fluoropolymer Films, Journal of Colloid and Interface Science, vol. 303, 517, 2006.

J. Kedzieski, and S. Berry, Engineering the Electrocapillary Behavior of Electrolyte Droplets on Thin Fluoropolymer Films, Langmuir, 22, 5690, 2006.

J.P. Urbanski, W. Thies, C. Rhodes, S. Amarasinghe, and T. Thorsen, Digital Microfluidics Using Soft Lithography, Lab on a Chip, 6, 96, 2006.

S. Berry, R. Hyers, L. Racz, and B. Abedian, Surface Oscillations of an Electromagnetically Levitated Droplet, International Journal of Thermophysics, vol. 26, no. 5, pp 1565-1581, September 2005.

T. Thorsen, S.J. Maerkl, and S.R. Quake, Microfluidic Large Scale Integration, Science, vol. 298, no. 5593, pp. 580-584, 2002.

T. Thorsen, R.W. Roberts, F.H. Arnold, and S.R. Quake, Dynamic Pattern Formation In A Vesicle-Generating Microfluidic Device, Physical Review Letters, vol. 86, no. 18, pp. 4163-4166, 2001.

S. Berry, R. Hyers, B. Abedian, and L. Racz, Modeling of Turbulent Flow in Electromagnetically Levitated Metal Droplets, Metallurgical and Materials Transactions B, vol. 31B, pp. 171-178, 2000.

M.A. Unger, H.-P. Chou, T. Thorsen, A. Scherer, and S.R. Quake, Monolithic Microfabricated Valves And Pumps By Multilayer Soft Lithography, Science, vol. 288, no. 5463, pp. 113-116, 2000.

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Microsystems

V. Carias, J. Thompson, P.M. Myers, P. Kumar, L. M. Racz, R. Toomey, J. Wang, Development of Mold Compounds with Ultralow Coefficient of Thermal Expansion and High Glass Transition Temperature for Fan-Out Wafer Level Packaging (FOWLP), IEEE Trans. Components, Packaging, and Manufacturing Technology, vol. 5, issue 7, p. 921, July, 2015.

B. Smith, P. Kwok, J. Thompson, A. Mueller, L.M. Racz, Thermal and Mechanical Considerations for a Silicon-Resin High Density (HDI) Substrate, IEEE Trans. Components, Packaging, and Manufacturing Technology, vol. 2, issue 7, p. 1092, July 2012.

J. Thompson, G. Tepolt, L. Racz, C.B. Rogers, V.P. Manno, R.D. White, A Multistep Process for Thinning Individual Die to Sub-35 µm Thickness, J. Microelectronics and Electronics Packaging, vol. 7, no. 4, p.189., Oct. 2010.

B. Smith, P. Kwok, J. Thompson, A. Mueller, L.M. Racz, Demonstration of a Novel Hybrid Silicon-Resin High Density Interconnect Substrate, Electronic Components and Technology Conference (ECTC), Proc. 60th, p.816., 1-4 June 2010. Winner of Best Paper in Session award

G. Lecarpentier, L. Racz, Device-Level Packaging for Optical Integration Challenges of High-Accuracy Bonding, Advanced Packaging vol12, no. 1, p. 17, 2003.

Lithography

Photoresists

Kenneth Diest, Russell Goodman, and Mordechai Rothschild, Nanochannel fabrication based on double patterning with hydrogen silsesquioxane, Journal of Vacuum Science & Technology B 33, 020601; doi: 10.1116/1.4906486., 2015.

R.P. Kingsborough, R.B. Goodman, K. Krohn, and T.H. Fedynyshyn, Lithographically Directed Surface Modification, Journal of Vacuum Science and Technology B, vol. 27, issue 6, pp. 3031-3037, 2009.

T.H. Fedynyshyn, R.B. Goodman, and J. Roberts, Polymer Matrix Effects On Acid Generation, Proceedings of SPIE, vol. 6923, 692319, 2008.

T.H. Fedynyshyn, I. Pottebaum, D.K. Astolfi, A. Cabral, J. Roberts, and R. Meagley, Contribution Of Photoacid Generator To Material Roughness, Journal of Vacuum Science and Technology B, vol. 24, issue 6, 3031, 2006.

R.R. Kunz, Photoresist Outgassing: A Potential Achilles Heel For Short Wavelength Optical Lithography? Proceedings of SPIE, vol. 5376, pp. 1-15, 2004.

I. Sondi, T.H. Fedynyshyn, R. Sinta, and E. Matijevic, Encapsulation Of Nanosized Silica By In Situ Polymerization Of Tert-Butyl Acrylate Monomer, Langmuir, vol. 16, pp. 9031-9034, 2000.

T.H. Fedynyshyn, R.R. Kunz, R.F. Sinta, R.B. Goodman, and S.P. Doran, Polymer Photochemistry At Advanced Optical Wavelengths, Journal of Vacuum Science and Technology B, vol.18, issue 6, 2000.

R.R. Kunz and D.K. Downs, Outgassing Of Organic Vapors From 193 nm Photoresists: Impact On Atmospheric Purity Near The Lens Optics, Journal of Vacuum Science and Technology B, vol. 17, issue 6, pp. 3330-3334, 1999.

R.R. Kunz, S.C. Palmateer, A.R. Forte, R.D. Allen, G.M. Wallraff, R.A. DiPietro, and D.C. Hofer, Limits To Etch Resistance For 193-nm Single-Layer Resists, Proceedings of SPIE, vol. 2724, pp. 365-376, 1996.

RR. Kunz, R.D. Allen, W.D. Hinsberg, and G.M. Wallraff, Acid-Catalyzed Single-Layer Resists For ArF Lithography, Optical Engineering, vol. 32, issue 10, pp. 2363-2367, 1993.

T.H. Fedynyshyn, C.R. Szmanda, R.F. Blacksmith, W.E. Houck, and J.C. Root, Relationship Between Resist Performance And Reaction Order In A Chemically Amplified Resist System, Journal of Vacuum Science and Technology B, vol. 11, issue 6, pp. 2798-2806, 1993.

T.H. Fedynyshyn, M.F. Cronin, and C.S. Szmanda, The Relationship Between Critical Dimension Shift And Diffusion In Negative Chemically Amplified Resist Systems, Journal of Vacuum Science and Technology B, vol. 9, issue 6, pp. 3380-3386, 1991.

Optical Materials

V. Liberman, S.T. Palmacci, and A. Grenville, Impact Of Photoacid Generator Leaching On Optics Photocontamination In 193-nm Immersion Lithography, Journal of Microlithography, Microfabrication, and Microsystems, vol. 6, issue 1, 2007.

V. Liberman, J.H.C. Sedlacek, T.H. Fedynyshyn, R.B. Goodman, M. Rothschild, and R. Sinta, Nanocomposite Approaches Toward Pellicles For 157-nm Lithography, Journal of Microlithography, Microfabrication, and Microsystems, vol. 4, issue 1, 2005.

V. Liberman, M. Rothschild, N.N. Efremow, S.T. Palmacci, J.H.C. Sedlacek, A. Grenville, and K. Orvek, Marathon Evaluation Of Optical Materials For 157-nm Lithography, Journal of Microlithography, Microfabrication, and Microsystems, vol. 2, issue 1, 2003.

M. Rothschild, D. Ehrlich, and D. Shaver, Effects Of Excimer Laser Irradiation On The Transmission, Index Of Refraction, And Density Of Ultraviolet Grade Fused Silica, Applied Physics Letters, vol. 55, pp. 1276-8, 1989.

Exposure Systems

M. Rothschild, A Roadmap For Optical Lithography, Optics & Photonics News, vol. 21, no. 6, pp. 26-31, 2010.

T. Bloomstein, T. Fedynyshyn, I. Pottebaum, M. Marchant, S. Deneault, and M. Rothschild, Immersion Patterning Down To 27 nm Half Pitch, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 24, issue 6, pp. 2789-2797, 2006.

V. Liberman, M. Rothschild, P. Murphy, and S. Palmacci, Prospects For Photolithography At 121 nm, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 20, issue 6, pp. 2567-2573, 2002.

M. Switkes and M. Rothschild, Immersion Lithography At 157 nm, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 6, pp. 2353-2356, 2001.

M. Rothschild, M. Horn, C. Keast, R. Kunz, V. Liberman, S. Palmateer, and D. Corliss, Photolithography At 193 nm, MIT Lincoln Laboratory Journal, vol. 10, no. 1, pp. 19-34, 1997.

M. Rothschild, R. Goodman, M. Hartney, M. Horn, R. Kunz, J. Sedlacek, and D. Shaver, Photolithography At 193 nm, Journal of Vacuum Science and Technology B, 10(6), pp. 2989-2996, 1992.

 

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