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Radiation effects in 3D integrated SOI SRAM circuits

Summary

Radiation effects are presented for the first time for vertically integrated 3 x 64 -kb SOI SRAM circuits fabricated using the 3D process developed at MIT Lincoln Laboratory. Three fully-fabricated 2D circuit wafers are stacked using standard CMOS fabrication techniques including thin-film planarization, layer alignment and oxide bonding. Micron-scale dense 3D vias are fabricated to interconnect circuits between tiers. Ionizing dose and single event effects are discussed for proton irradiation with energies between 4.8 and 500 MeV. Results are compared with 14-MeV neutron irradiation. Single event upset cross section, tier-to-tier and angular effects are discussed. The interaction of 500-MeV protons with tungsten interconnects is investigated usingMonte-Carlo simulations. Results show no tier-to-tier effects and comparable radiation effects on 2D and 3D SRAMs. 3DIC technology should be a good candidate for fabricating circuits for space applications.
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Summary

Radiation effects are presented for the first time for vertically integrated 3 x 64 -kb SOI SRAM circuits fabricated using the 3D process developed at MIT Lincoln Laboratory. Three fully-fabricated 2D circuit wafers are stacked using standard CMOS fabrication techniques including thin-film planarization, layer alignment and oxide bonding. Micron-scale dense...

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SET characterization in logic circuits fabricated in a 3DIC technology

Summary

Single event transients are characterized for the first time in logic gate circuits fabricated in a novel 3DIC technology where SET test circuits are vertically integrated on three tiers in a 20-um-thick layer. This 3D technology is extremely will suited for high-density circuit integration because of the small dimension the tier-to-tier circuit interconnects, which are 1.25-um-wide-through-oxide-vias. Transient pulse width distributions were characterized simultaneously on each tier during exposure to krypton heavy ions. The difference in SET pulse width and cross-section among the three tiers is discussed. Experimental test results are explaine dby considering the electrical characteristics of the FETs on the 2D wafers before 3D integration, and by considering the energy deposited by the Kr ions passing through the various material laters of the 3DIC stack. We also show that the backmetal layer available on the upper tiers can be used to tune independently the nFET and pFET current drive, and change the SET pulse width and cross-section. This 3DIC technology appears to be a good candidate for space applications.
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Summary

Single event transients are characterized for the first time in logic gate circuits fabricated in a novel 3DIC technology where SET test circuits are vertically integrated on three tiers in a 20-um-thick layer. This 3D technology is extremely will suited for high-density circuit integration because of the small dimension the...

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FDSOI process technology for subthreshold-operation ultra-low power electronics

Published in:
ECS Meeting, 1 May 2011 (in: Adv. Semiconductor-on-Insulator Technol. Rel. Phys., Vol. 35, No. 5, 2011, pp. 179-188).
Topic:

Summary

Ultralow-power electronics will expand the technological capability of handheld and wireless devices by dramatically improving battery life and portability. In addition to innovative low-power design techniques, a complementary process technology is required to enable the highest performance devices possible while maintaining extremely low power consumption. Transistors optimized for subthreshold operation at 0.3 V may achieve a 97% reduction in switching energy compared to conventional transistors. The process technology described in this article takes advantage of the capacitance and performance benefits of thin-body silicon-on-insulator devices, combined with a workfunction engineered mid-gap metal gate.
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Summary

Ultralow-power electronics will expand the technological capability of handheld and wireless devices by dramatically improving battery life and portability. In addition to innovative low-power design techniques, a complementary process technology is required to enable the highest performance devices possible while maintaining extremely low power consumption. Transistors optimized for subthreshold operation...

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SOI-enabled three-dimensional integrated-circuit technology

Published in:
2010 IEEE Int. SOI Conf., 11 October 2010.

Summary

We have demonstrated a new 3D device interconnect approach, with direct back side via connection to a transistor in a 3D stack, resulting in a reduced 3D footprint by an estimated ~40% as well as potential for lower series resistance. We have demonstrated high yield 3D through-oxide-via (TOV) with a 40% size reduction to 1.0 ?m and with an associated exclusion zone reduced by a factor of 2, substantially smaller than in bulk-Si 3D through-siliconvia (TSV) approaches. These significant enhancements were demonstrated with our 3D technology based on conventional SOI wafers.
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Summary

We have demonstrated a new 3D device interconnect approach, with direct back side via connection to a transistor in a 3D stack, resulting in a reduced 3D footprint by an estimated ~40% as well as potential for lower series resistance. We have demonstrated high yield 3D through-oxide-via (TOV) with a...

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FDSOI process technology for subthreshold-operation ultralow-power electronics

Published in:
Proc. of the IEEE, Vol. 98, No. 2, February 2010, pp. 333-342.
Topic:

Summary

Ultralow-power electronics will expand the technological capability of handheld and wireless devices by dramatically improving battery life and portability. In addition to innovative low-power design techniques, a complementary process technology is required to enable the highest performance devices possible while maintaining extremely low power consumption. Transistors optimized for subthreshold operation at 0.3 V may achieve a 97% reduction in switching energy compared to conventional transistors. The process technology described in this article takes advantage of the capacitance and performance benefits of thin-body silicon-oninsulator devices, combined with a workfunction engineered mid-gap metal gate.
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Summary

Ultralow-power electronics will expand the technological capability of handheld and wireless devices by dramatically improving battery life and portability. In addition to innovative low-power design techniques, a complementary process technology is required to enable the highest performance devices possible while maintaining extremely low power consumption. Transistors optimized for subthreshold operation...

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Three-dimensional integration technology for advanced focal planes

Summary

We have developed a three-dimensional (3D) circuit integration technology that exploits the advantages of silicon-on-insulator (SOI) technology to enable wafer-level stacking and micrometer-scale electrical interconnection of fully fabricated circuit wafers. This paper describes the 3D technology and discusses some of the advanced focal plane arrays that have been built using it.
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Summary

We have developed a three-dimensional (3D) circuit integration technology that exploits the advantages of silicon-on-insulator (SOI) technology to enable wafer-level stacking and micrometer-scale electrical interconnection of fully fabricated circuit wafers. This paper describes the 3D technology and discusses some of the advanced focal plane arrays that have been built using...

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Time delay integration and in-pixel spatiotemporal filtering using a nanoscale digital CMOS focal plane readout

Summary

A digital focal plane array (DFPA) architecture has been developed that incorporates per-pixel full-dynamic-range analog-to-digital conversion and orthogonal-transfer-based realtime digital signal processing capability. Several long-wave infrared-optimized pixel processing focal plane readout integrated circuit (ROIC) designs have been implemented, each accommodating a 256 x 256 30-um-pitch detector array. Demonstrated in this paper is the application of this DFPA ROIC architecture to problems of background pedestal mitigation, wide-field imaging, image stabilization, edge detection, and velocimetry. The DFPA architecture is reviewed, and pixel performance metrics are discussed in the context of the application examples. The measured data reported here are for DFPA ROICs implemented in 90-nm CMOS technology and hybridized to HgxCd1-xTe (MCT) detector arrays with cutoff wavelengths ranging from 7 to 14.5 m and a specified operating temperature of 60 K-80 K.
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Summary

A digital focal plane array (DFPA) architecture has been developed that incorporates per-pixel full-dynamic-range analog-to-digital conversion and orthogonal-transfer-based realtime digital signal processing capability. Several long-wave infrared-optimized pixel processing focal plane readout integrated circuit (ROIC) designs have been implemented, each accommodating a 256 x 256 30-um-pitch detector array. Demonstrated in this...

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Wafer-scale 3D integration of InGaAs image sensors with Si readout circuits

Summary

In this work, we modified our wafer-scale 3D integration technique, originally developed for Si, to hybridize InP-based image sensor arrays with Si readout circuits. InGaAs image arrays based on the InGaAs layer grown on InP substrates were fabricated in the same processing line as silicon-on-insulator (SOI) readout circuits. The finished 150-mm-diameter InP wafer was then directly bonded to the SOI wafer and interconnected to the Si readout circuits by 3D vias. A 1024 x 1024 diode array with 8-um pixel size is demonstrated. This work shows the wafer-scale 3D integration of a compound semiconductor with Si.
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Summary

In this work, we modified our wafer-scale 3D integration technique, originally developed for Si, to hybridize InP-based image sensor arrays with Si readout circuits. InGaAs image arrays based on the InGaAs layer grown on InP substrates were fabricated in the same processing line as silicon-on-insulator (SOI) readout circuits. The finished...

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Characterization of a three-dimensional SOI integrated-circuit technology

Published in:
2008 IEEE Int. SOI Conf. Proc., 6 October 2008, pp. 109-110.

Summary

At Lincoln Laboratory, we have established a three dimensional (3D) integrated circuit (IC) technology that has been developed and demonstrated over eight designs, bonding two or three active circuit layers or tiers to form monolithically integrated 3D circuits. This technology has been used to successfully demonstrate a large-area 8 x 8 mm2 high-3D-via-count 1024 x 1024 visible image, a 64 x 64 laser radar focal plane based on single-photon-sensitive avalanche photodiodes, and a 10Gb/s/pin low power interconnect for 3DICs. 3DIC technology in our most recently completed 3D multiproject (3DM2) run includes three active fully-depleted-SOI (FDSOI) circuit tiers, eleven interconnect-metal layers, and dense unrestricted 3D vias interconnecting stacked circuit layers, as shown in Figure 1. While we continue our efforts to scale our 3DIC technology and increase 3D via density, we are also working to improve our understanding of 3D integration impact on transistor and process monitor circuits. In this paper, we describe our process and test results after single tier circuit fabrication as well as after three-tier integration, determine impact of 3D vias on ring oscillator performance, and demonstrate functionality of single and multi-tier circuits of varying complexity.
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Summary

At Lincoln Laboratory, we have established a three dimensional (3D) integrated circuit (IC) technology that has been developed and demonstrated over eight designs, bonding two or three active circuit layers or tiers to form monolithically integrated 3D circuits. This technology has been used to successfully demonstrate a large-area 8 x...

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InP-based single-photon detector arrays with asynchronous readout integrated circuits

Summary

We have developed and demonstrated a highduty- cycle asynchronous InGaAsP-based photon counting detector system with near-ideal Poisson response, roomtemperature operation, and nanosecond timing resolution for near-infrared applications. The detector is based on an array of Geiger-mode avalanche photodiodes coupled to a custom integrated circuit that provides for lossless readout via an asynchronous, nongated architecture. We present results showing Poisson response for incident photon flux rates up to 10 million photons per second and multiple photons per 3-ns timing bin.
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Summary

We have developed and demonstrated a highduty- cycle asynchronous InGaAsP-based photon counting detector system with near-ideal Poisson response, roomtemperature operation, and nanosecond timing resolution for near-infrared applications. The detector is based on an array of Geiger-mode avalanche photodiodes coupled to a custom integrated circuit that provides for lossless readout via...

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