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High-quality 150 nm InP-to-silicon epitaxial transfer for silicon photonic integrated circuits

Published in:
Electrochem. Solid-State Lett., Vol. 12, No. 4, January 2009, pp. H101-H104.

Summary

We demonstrate the transfer of the largest (150 mm in diameter) available InP-based epitaxial structure to the silicon-on-insulator substrate through a direct wafer-bonding process. Over 95% bonding yield and a void-free bonding interface was obtained. A multiple quantum-well diode laser structure is well-preserved after bonding, as indicated by the high-resolution X-ray diffraction measurement and photoluminescence (PL) map. A bowing of 64.12 um is measured, resulting in a low bonding-induced strain of 17 MPa. PL measurement shows a standard deviation of 1.09% across the entire bonded area with less than 1.1 nm wavelength shift from the as-grown wafer.
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Summary

We demonstrate the transfer of the largest (150 mm in diameter) available InP-based epitaxial structure to the silicon-on-insulator substrate through a direct wafer-bonding process. Over 95% bonding yield and a void-free bonding interface was obtained. A multiple quantum-well diode laser structure is well-preserved after bonding, as indicated by the high-resolution...

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A 64 x 64-pixel CMOS test chip for the development of large-format ultra-high-speed snapshot imagers

Summary

A 64 x 64-pixel test circuit was designed and fabricated in 0.18- m CMOS technology for investigating high-speed imaging with large-format imagers. Several features are integrated into the circuit architecture to achieve fast exposure times with low-skew and jitter for simultaneous pixel snapshots. These features include an H-tree clock distribution with local and global repeaters, single-edge trigger propagation, local exposure control, and current-steering sampling circuits. To evaluate the circuit performance, test structures are periodically located throughout the 64 x 64-pixel device. Measured devices have exposure times that can be varied between 75 ps to 305 ps with skew times for all pixels less than +-3 ps and jitter that is less than +-1.2 ps rms. Other performance characteristics are a readout noise of approximately 115 e- rms and an upper dynamic range of 310,000 e-.
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Summary

A 64 x 64-pixel test circuit was designed and fabricated in 0.18- m CMOS technology for investigating high-speed imaging with large-format imagers. Several features are integrated into the circuit architecture to achieve fast exposure times with low-skew and jitter for simultaneous pixel snapshots. These features include an H-tree clock distribution...

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Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography

Published in:
SPIE Vol. 6924, Optical Microlithography XXI, 26-27 February 2008, pp. 69244R.

Summary

To enable development of novel signal processing circuits, a high-speed surface-channel charge coupled device (CCD) process has been co-integrated with the Lincoln Laboratory 180-nm RF fully depleted silicon-on-insulator (FDSOI) CMOS technology. The CCDs support charge transfer clock speeds in excess of 1 GHz while maintaining high charge transfer efficiency (CTE). Both the CCD and CMOS gates are formed using a single-poly process, with CCD gates isolated by a narrow phase-shift-defined gap. CTE is strongly dependent on tight control of the gap critical dimension (CD). In this paper we review the tradeoffs encountered in the co-integration of the CCD and CMOS technologies. The effect of partial coherence on gap resolution and pattern fidelity is discussed. The impact of asymmetric bias due to phase error and phase shift mask (PSM) sidewall effects is presented, along with adopted mitigation strategies. Issues relating to CMOS pattern fidelity and CD control in the double patterning process are also discussed. Since some signal processing CCD structures involve two-dimensional transfer paths, many required geometries present phase compliance and trim engineering challenges. Approaches for implementing noncompliant geometries, such as T shapes, are described, and the impact of various techniques on electrical performance is discussed.
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Summary

To enable development of novel signal processing circuits, a high-speed surface-channel charge coupled device (CCD) process has been co-integrated with the Lincoln Laboratory 180-nm RF fully depleted silicon-on-insulator (FDSOI) CMOS technology. The CCDs support charge transfer clock speeds in excess of 1 GHz while maintaining high charge transfer efficiency (CTE)...

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Design approaches for digitally dominated active pixel sensors: leveraging Moore's law scaling in focal plane readout design

Summary

Although CMOS technology scaling has provided tremendous power and circuit density benefits for innumerable applications, focal plane array (FPA) readouts have largely been left behind due to dynamic range and signal-to-noise considerations. However, if an appropriate pixel front end can be constructed to interface with a mostly digital pixel, it is possible to develop sensor architectures for which performance scales favorably with advancing technology nodes. Although the front-end design must be optimized to interface with a particular detector, the dominant back end architecture provides considerable potential for design reuse. In this work, digitally dominated long wave infrared (LWIR) active pixel sensors with cutoff wavelengths between 9 and 14.5 um are demonstrated. Two ROIC designs are discussed, each fabricated in a 90-nm digital CMOS process and implementing a 256 x 256 pixel array on a 30-um pitch. In one of the implemented designs, the feasibility of implementing a 15-um pixel pitch FPA with a 500 million electron effective well depth, less than 0.5% non-linearity in the target range and a measured NEdT of less than 50 mK at f/4 and 60 K is demonstrated. Simple on-FPA signal processing allows for a much reduced readout bandwidth requirement with these architectures. To demonstrate the potential for commonality that is offered by a digitally dominated architecture, this LWIR sensor design is compared and contrasted with other digital focal plane architectures. Opportunities and challenges for application of this approach to various detector technologies, optical wavelength ranges and systems are discussed.
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Summary

Although CMOS technology scaling has provided tremendous power and circuit density benefits for innumerable applications, focal plane array (FPA) readouts have largely been left behind due to dynamic range and signal-to-noise considerations. However, if an appropriate pixel front end can be constructed to interface with a mostly digital pixel, it...

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Back-illuminated three-dimensionally integrated CMOS image sensors for scientific applications

Published in:
SPIE Vol. 6690, Focal Plane Arrays for Space Telescopes III, 27-28 August 2007, 669009.

Summary

SOI-based active pixel image sensors have been built in both monolithic and vertically interconnected pixel technologies. The latter easily supports the inclusion of more complex pixel circuitry without compromising pixel fill factor. A wafer-scale back-illumination process is used to achieve 100% fill factor photodiodes. Results from 256 x 256 and 1024 x 1024 pixel arrays are presented, with discussion of dark current improvement in the differing technologies.
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Summary

SOI-based active pixel image sensors have been built in both monolithic and vertically interconnected pixel technologies. The latter easily supports the inclusion of more complex pixel circuitry without compromising pixel fill factor. A wafer-scale back-illumination process is used to achieve 100% fill factor photodiodes. Results from 256 x 256 and...

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The digital focal plane array (DFPA) architecture for data processing "on-chip"

Published in:
2007 Meeting of the Military Sensing Symposia (MSS) Specialty Group on Camouflage, Concealment & Deception; Passive Sensors; Detectors; and Materials, 5-9 February 2007.

Summary

The digital focal plane array (DFPA) project seeks to develop readout integrated circuits (ROICs) utilizing aggressively scaled and commercially available CMOS. Along with focal plane scaling and readout robustness benefits, the DFPA architecture provides a very simple way to implement processing algorithms directly on image data, in real-time, and prior to read-out of the data to an external digitizer or computer. In principle, almost any linear image processing filter kernel can be convolved with the scene image prior to readout. The useful size of the filter kernel is only limited by the size of the DFPA. Time domain filters can also be implemented on the ROIC to accomplish digital time domain integration (TDI) or change detection algorithms. The unique architecture can achieve the processing capability without the use of traditional digital adders or multipliers, like those used in most signal processors. Instead, a DFPA manipulates sequential digital counters under every pixel in a unique way to achieve the desired functionality. A non-addressable readout scheme is used for data transfer in four possible directions across the array. Although we are currently targeting longwave infrared (LWIR) applications, the approach can be potentially applied to any imaging application in any band.
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Summary

The digital focal plane array (DFPA) project seeks to develop readout integrated circuits (ROICs) utilizing aggressively scaled and commercially available CMOS. Along with focal plane scaling and readout robustness benefits, the DFPA architecture provides a very simple way to implement processing algorithms directly on image data, in real-time, and prior...

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Optimized growth of lattice-matched In(x)Al(1-x)N/GaN heterostructures by molecular beam epitaxy

Published in:
Appl. Phys. Lett., Vol. 90, No. 2, 8 January 2007, pp. 021922-1 - 021922-3.

Summary

The authors present a systematic study on the growth of the ternary compound In(x)Al(1-x)N by molecular beam epitaxy. This work concentrates on In mole fractions x around 0.17, as this composition is in-plane lattice matched to GaN. At a growth temperature of 540 degrees C, high quality material was obtained using a total metal to nitrogen flux ratio of ~1. Using these growth parameters, high quality GaN/InAlN superlattices were obtained without growth interruptions.
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Summary

The authors present a systematic study on the growth of the ternary compound In(x)Al(1-x)N by molecular beam epitaxy. This work concentrates on In mole fractions x around 0.17, as this composition is in-plane lattice matched to GaN. At a growth temperature of 540 degrees C, high quality material was obtained...

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Laser radar imager based on 3D integration of Geiger-mode avalanche photodiodes with two SOI timing circuit layers

Summary

We have developed focal-plane arrays and laser-radar (ladar) imaging systems based on Geiger-mode avalanche photodiodes (APDs) integrated with high-speed all-digital CMOS timing circuits. A Geiger-mode APD produces a digital pulse upon detection of a single photon. This pulse is used to stop a fast digital counter in the pixel circuit, thereby measuring photon arrival time. This "photon-to-digital conversion" yields quantum-limited sensitivity and noiseless readout, enabling high-performance ladar systems. Previously reported focal planes, based on bump bonding or epoxy bonding the APDs to foundry chips, had coarse (100um) pixel spacing and 0.5ns timing quantization.
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Summary

We have developed focal-plane arrays and laser-radar (ladar) imaging systems based on Geiger-mode avalanche photodiodes (APDs) integrated with high-speed all-digital CMOS timing circuits. A Geiger-mode APD produces a digital pulse upon detection of a single photon. This pulse is used to stop a fast digital counter in the pixel circuit...

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Nitride-based UV Geiger-Mode avalanche photodiodes

Published in:
2005 Int. Semiconductor Device Research Symp., 7-9 December 2005.

Summary

III-N materials currently enjoy a predominant role in the formation of solid-state light emitters for [lamda]
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Summary

III-N materials currently enjoy a predominant role in the formation of solid-state light emitters for [lamda]

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CMOS detector technology

Published in:
Exp. Astron., Vol. 19, No. 1-3, 2005, pp. 111-34.
Topic:

Summary

An entry level overview of state-of-the-art CMOS detector technology is presented. Operating principles and system architecture are explained in comparison to the well-established CCD technology, followed by a discussion of important benefits of modern CMOS-based detector arrays. A number of unique CMOS features including different shutter modes and scanning concepts are described. In addition, sub-field stitching is presented as a technique for producing very large imagers. After a brief introduction to the concept of monolithic CMOS sensors, hybrid detectors technology is introduced. A comparison of noise reduction methods for CMOS hybrids is presented. The final sections review CMOS fabrication processes for monolithic and vertically integrated image sensors.
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Summary

An entry level overview of state-of-the-art CMOS detector technology is presented. Operating principles and system architecture are explained in comparison to the well-established CCD technology, followed by a discussion of important benefits of modern CMOS-based detector arrays. A number of unique CMOS features including different shutter modes and scanning concepts...

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