Efficient High-Harmonic-Generation-Based EUV Source Driven by Short Wavelength Light

Extreme ultraviolet (EUV) radiation carries significant relevance in the fields of lithography, microscopy, and astrophysics because of its high energy and short wavelength. The challenge has been generating this radiation in a feasible and efficient manner without incurring excessive energy costs. Current technology's reliance on complex machinery and high energy consumption makes the process cost-prohibitive and inaccessible for many applications. The methods also often yield lower harmonic waves, limiting the level of radiation and the effectiveness of the technology. Thus, there is a need for a technology that can generate EUV radiation more efficiently.

Technology Description

The technology under discussion involves the generation of extreme ultraviolet radiation relying heavily on high-order harmonic generation. Initially, a driver pulse originating from a drive laser is produced. Afterwards, this infrared driver pulse is ushered through a second harmonic generator that has an output wavelength that lies between 400 and 700 nm. Ultimately, this pulse is guided through a gas medium, which could be housed within a resonant cavity, to generate a high-order harmonic transforming into extreme ultraviolet radiation. This technology differentiates itself by leveraging harmonic generation to create ultraviolet radiation. The usage of a resonant cavity housing a gaseous medium further accentuates the conversion of high-order harmonics into ultraviolet radiation, rendering such a methodology efficient and potentially more effective in generating ultraviolet radiation than traditional methods.