Liquid Low-Temperature Oxide

Silicate glass is commonly used in a wide array of applications, from everyday items like windows and dishes to specialized uses in the technology and science sectors such as fiber optics and laboratory glassware. Traditionally, forming this versatile material requires high-temperature processes that are both energy-consuming and challenging to control. The process of forming silicate glass at high temperatures poses numerous challenges. High heat can instigate material deformation and result in inconsistency in the final product. Moreover, energy expenditure during these high-temperature processes contributes to environmental pollution. As a result, there is a clear need for a method to form silicate glass that can overcome these limitations.

Technology Description

The technology is a process for forming structures such as silicate glass at low temperatures. Initially, a liquid oxide material is formed by dissolving fumed nanoparticles in a liquid hydrate of silicate or aluminate. Then, this liquid oxide material is applied to a substrate. In the final step, this applied material is cured at low temperatures, facilitating the evolution of gaseous water and leaving behind a structural silicate glass. This method is distinguished by its innovative low-temperature approach. While the traditional method of forming silicate glass involves high-temperature processes that are energy-intensive, this technology reduces energy consumption by functioning at low temperatures. Furthermore, it enables precision in forming structures because of the use of fumed nanoparticles, which can lead to enhanced qualities of the resulting silicate glass.