Extreme Ultraviolet Lithography (EUVL) and Source Workshop

The 2025 Extreme Ultraviolet Lithography (EUVL) and Source Workshop will be held at Lincoln Laboratory. This annual workshop, organized by EUV Litho, Inc., is a unique forum to discuss the challenge and progress of EUVL as it is being implemented in state-of-the-art semiconductor manufacturing. This workshop, co-organized with Lincoln Laboratory, will also focus on emerging new directions, which would enable semiconductor manufacturing to the end of this decade and well into the 2030s. In particular, leading researchers will present on hyper-NA lithography at 13.5 nm and on the various aspects of lithography at wavelengths below 13.5 nm (Blue-X), including sources, optics, optical design, photomasks, and photoresists.  

June 21-22 will consist of online short courses, while June 23-26 will be an in-person workshop at Lincoln Laboratory.