Mordechai Rothschild

Dr. Mordechai Rothschild is principal staff in the Advanced Technology Division. He leads technology strategy and exploitation activities across the division, focusing on novel devices and sensor technologies. He has led programs in metamaterials, microfluidics, and nanofabrication, and has managed programs to develop multifunctional microsystems combining optics, mechanics, and microfluidics. Previously, he played a leading role in the development of advanced optical lithography technologies, including 193-nm and liquid-immersion lithography. 

Rothschild has authored or coauthored more than 220 papers and conference proceedings in the fields of photochemistry, spectroscopy, lithography, nanodevices, and chemical detection. He is also the co-inventor of 16 patented technologies. He co-chaired the 2012 Lithography Workshop, and he is a member of the program committee of the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. He is the recipient of the 2014 SPIE Frits Zernike Award in Lithography and of the 2015 Edwin H. Land medal awarded jointly by the Society for Imaging Science and Technology and the Optical Society of America.

Rothschild received a BS degree in physics from Bar-Ilan University and a PhD in optics from the University of Rochester.