Theodore Fedynyshyn

Dr. Theodore Fedynyshyn was a senior staff member of the Chemical, Microsystem, and Nanoscale Technologies Group at Lincoln Laboratory, pursuing research in a variety of novel material areas, including 3D printing of functional materials, advanced lithography techniques and unique materials employed to simulate and mitigate chemical agent threats. Shortly after joining Lincoln Laboratory, he initiated a synthetic chemical research group and designed, built, and equipped a new synthesis and analytical chemical laboratory.

Fedynyshyn led a team that developed spatially and chemically modified surfaces that exhibit superhydrophobicity and switchable adhesion. He also led work to identify simulants for a chemical aerosol testing. In earlier work, he was the team lead on a research project to determine the phenomenology of laboratory-synthesized surrogate chemical agents and to quantify current detector capability toward those surrogates, resulting in improved sampling strategies for site assessment missions. Previously, he led a joint Shipley-IBM research team that developed the first deep-ultraviolet resist used in integrated circuit mass production and was instrumental in leading the development of several new technologies for nanometer-scale imaging with a variety of lithography energy sources.

Fedynyshyn, a Fellow of SPIE, is a world-recognized leader in the field of resists for microlithography and has published seminal papers on resist theory and performance that have formed the basis for all modern lithographic simulation. He has published 97 technical papers, primarily in the area of lithography, and holds 20 U.S. patents. He has accepted numerous leadership positions at technical conferences and on industry technical committees, including conference chairman of the SPIE Conference in Advances in Resist Technology and Processing, conference chairman of the Electron Ion and Photon Beam and Nanotechnology Conference, and leader of the resist section of the Semiconductor Industry Association Technical Working Group responsible for developing the International Technology Roadmap for Semiconductors.

Fedynyshyn received a BS degree in chemistry from Lehigh University, a PhD degree in organic chemistry from Brown University, and an MBA degree in marketing from the University of New Haven. He was also a postdoctoral associate at Rensselaer Polytechnic Institute and a visiting fellow at Yale University.