Publications
A nanoparticle convective directed assembly process for the fabrication of periodic surface enhanced Raman spectroscopy substrates
October 8, 2010
Journal Article
Published in:
Adv. Mater., Vol. 22, No. 38, 8 October 2010, pp. 4298-4302.
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Summary
A highly scalable approach for producing surface-enhanced Raman spectroscopy substrates is introduced. The novel method involves assembling individual nanoparticles in pre-defined templates, one particle per template, forming a high denisity of nanogaps over large areas, while decoupling nanostructure synthesis from placement.
Summary
A highly scalable approach for producing surface-enhanced Raman spectroscopy substrates is introduced. The novel method involves assembling individual nanoparticles in pre-defined templates, one particle per template, forming a high denisity of nanogaps over large areas, while decoupling nanostructure synthesis from placement.
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Monolithic 3.3V CCD/SOI-CMOS Imager Technology
December 10, 2000
Conference Paper
Published in:
IEEE Int. Eelctron Devices Mtg., 10-13 December 2000, pp. 30.3.1-30.3.4.
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Summary
We have developed a merged CCD/SOI-CMOS technology that enables the fabrication of monolithic, low-power imaging systems on a chip. The CCD's, fabricated in the bulk handle wafer, have charge-transfer inefficiencies of about 1x10(-5) and well capacities of more than 100,000 electrons with 3.3-V clocks and 8x8um pixels. Fully depleted 0.35pm SOI-CMOS ring oscillators have stage delay of 48ps at 3.3V. We demonstrate for the first time an integrated image sensor with charge-domain A/D conversion and on-chip clocking.
Summary
We have developed a merged CCD/SOI-CMOS technology that enables the fabrication of monolithic, low-power imaging systems on a chip. The CCD's, fabricated in the bulk handle wafer, have charge-transfer inefficiencies of about 1x10(-5) and well capacities of more than 100,000 electrons with 3.3-V clocks and 8x8um pixels. Fully depleted 0.35pm...
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