Publications

Grayscale lithography is a widely known but underutilized microfabrication technique for creating three-dimensional (3-D) microstructures in photoresist. One of the hurdles for its widespread use is that developing the grayscale photolithography masks can be time-consuming and costly since it often requires an iterative process, especially for complex geometries. We discuss the use of PROLITH, a lithography simulation tool, to predict 3-D photoresist profiles from grayscale mask designs. Several examples of optical microsystems and microelectromechanical systems where PROLITH was used to validate the mask design prior to implementation in the microfabrication process are presented. In all examples, PROLITH was able to accurately and quantitatively predict resist profiles, which reduced both design time and the number of trial photomasks, effectively reducing the cost of component fabrication.

We present a parallel implementation of the Fast Accurate NURBS Optimization (FANO) program using OpenMP and MPI. The software is used for designing imaging freeform optical systems comprised of NURBS surfaces. An important step in the design process is the optimization of the shape and position of the optical surfaces within the optical system. FANO uses the Levenberg-Marquardt (LM) algorithm for minimization of the merit function. The parallelization of the code is achieved without modifying readily available commercial or open source implementations of the LM algorithm. Instead, MPI instructions are being used to distribute the computation of the Jacobian over multiple nodes, each of which performs the computationally intensive task of raytracing. The results from the raytracing are collected on the master and used for calculating the values of the variable parameters for the next iteration. Speed increases of ~100x and more are possible when running on the cluster of the MIT Lincoln Laboratory Super Computing Center (LLSC).

The Transiting Exoplanet Survey Satellite, a NASA Explorer-class mission in development, will discover planets around nearby stars, most notably Earth-like planets with potential for follow up characterization. The all-sky survey requires a suite of four wide field-of-view cameras with sensitivity across a broad spectrum. Deep depletion CCDs with a silicon layer of 100 um thickness serve as the camera detectors, providing enhanced performance in the red wavelengths for sensitivity to cooler stars. The performance of the camera is critical for the mission objectives, with both the optical system and the CCD detectors contributing to the realized image quality. Expectations for image quality are studied using a combination of optical ray tracing in Zemax and simulations in Matlab to account for the interaction of the incoming photons with the 100 um silicon layer. The simulations include a probabilistic model to determine the depth of travel in the silicon before the photons are converted to photo-electrons, and a Monte Carlo approach to charge diffusion. The charge diffusion model varies with the remaining depth for the photo-electron to traverse and the strength of the intermediate electric field. The simulations are compared with laboratory measurements acquired by an engineering unit camera with the TESS optical design and deep depletion CCDs. In this paper we describe the performance simulations and the corresponding measurements taken with the engineering unit camera, and discuss where the models agree well in predicted trends and where there are differences compared to observations.