Publications

Refine Results

(Filters Applied) Clear All

Epitaxial graphene transistors on SiC substrates

Published in:
IEEE Trans. Electron Devices, Vol. 55, No. 8, August 2008, pp. 2078-2085.

Summary

This paper describes the behavior of top-gated transistors fabricated using carbon, specifically epitaxial graphene on SiC, as the active material. Although graphene devices have been built before, in this paper, we provide the first demonstration and systematic evaluation of arrays of a large number of transistors produced using standard microelectronics methods. The graphene devices presented feature high-k dielectric, mobilities up to 5000 cm2/V · s, and Ion/Ioff ratios of up to seven, and are methodically analyzed to provide insight into the substrate properties. Typical of graphene, these micrometer-scale devices have negligible band gaps and, therefore, large leakage currents.
READ LESS

Summary

This paper describes the behavior of top-gated transistors fabricated using carbon, specifically epitaxial graphene on SiC, as the active material. Although graphene devices have been built before, in this paper, we provide the first demonstration and systematic evaluation of arrays of a large number of transistors produced using standard microelectronics...

READ MORE

CMOS-compatible dual-output silicon modulator for analog signal processing

Summary

A broadband, Mach-Zehnder-interferometer based silicon optical modulator is demonstrated, with an electrical bandwidth of 26 GHz and V[pi]L of 4 V·cm. The design of this modulator does not require epitaxial overgrowth and is therefore simpler to fabricate than previous devices with similar performance.
READ LESS

Summary

A broadband, Mach-Zehnder-interferometer based silicon optical modulator is demonstrated, with an electrical bandwidth of 26 GHz and V[pi]L of 4 V·cm. The design of this modulator does not require epitaxial overgrowth and is therefore simpler to fabricate than previous devices with similar performance.

READ MORE

Higher order cochlea-like channelizing filters

Published in:
IEEE Trans. Microw. Theory Tech., Vol. 56, No. 7, July 2008, pp. 1675-1683.

Summary

A design method is presented for contiguous-channel multiplexing filters with many channels covering a wide bandwidth. The circuit topology extends previous work on cochlea-like channelizers by introducing multiple resonator-channel filter sections. The new design provides increased stopband rejection, lower insertion loss, and improved passband shape compared with the earlier version while retaining a simple design method and a compact layout, and requires no post-fabrication tuning. Results of a three-pole ten-channel channelizer covering from 182 MHz to 1.13 GHz with 17.5% bandwidth channels and 1.1-dB insertion loss are presented, and agree well with theory. A discussion of the power handling of planar channelizers is also presented.
READ LESS

Summary

A design method is presented for contiguous-channel multiplexing filters with many channels covering a wide bandwidth. The circuit topology extends previous work on cochlea-like channelizers by introducing multiple resonator-channel filter sections. The new design provides increased stopband rejection, lower insertion loss, and improved passband shape compared with the earlier version...

READ MORE

Reliable large format arrays of Geiger-mode avalanche photodiodes

Published in:
IPRM 2008, 20th Int. Conf. on Indium Phosphide and Related Materials, 25-29 May 2008.
Topic:

Summary

The fabrication of reliable InP-based Geigermode avalanche photodiode arrays is described. Arrays of up to 256 x 64 elements have been produced and mated to silicon read-out circuits forming single-photon infrared focal plane imagers for 1.06 and 1.5 mum applications.
READ LESS

Summary

The fabrication of reliable InP-based Geigermode avalanche photodiode arrays is described. Arrays of up to 256 x 64 elements have been produced and mated to silicon read-out circuits forming single-photon infrared focal plane imagers for 1.06 and 1.5 mum applications.

READ MORE

Geiger-mode quad-cell array for adaptive optics

Published in:
CLEO-QELS, 2008 Conf. on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conf., 4-9 May 2008.

Summary

We report an array of Shack-Hartmann wavefront sensors using high-fill-factor Geiger-mode avalanche detector quad cells hybridized to all-digital CMOS counting circuits. The absence of readout noise facilitates fast wavefront sensing at low light levels.
READ LESS

Summary

We report an array of Shack-Hartmann wavefront sensors using high-fill-factor Geiger-mode avalanche detector quad cells hybridized to all-digital CMOS counting circuits. The absence of readout noise facilitates fast wavefront sensing at low light levels.

READ MORE

Slab-coupled optical waveguide photodiode

Published in:
CLEO-QELS, 2008 Conf. on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conf., 4-9 May 2008.
Topic:

Summary

We report the first high-current photodiode based on the slab-coupled optical waveguide concept. The device has a large mode (5.8 x 7.6 um) and ultra-low optical confinement ([] ~ 0.05%), allowing a 2-mm absorption length. The maximum photocurrent obtained was 250 mA (R = 0.8-A/W) at 1.55 um.
READ LESS

Summary

We report the first high-current photodiode based on the slab-coupled optical waveguide concept. The device has a large mode (5.8 x 7.6 um) and ultra-low optical confinement ([] ~ 0.05%), allowing a 2-mm absorption length. The maximum photocurrent obtained was 250 mA (R = 0.8-A/W) at 1.55 um.

READ MORE

Effect of carrier lifetime on forward-biased silicon Mach-Zehnder modulators

Summary

We present a systematic study of Mach-Zehnder silicon optical modulators based on carrier-injection. Detailed comparisons between modeling and measurement results are made with good agreement obtained for both DC and AC characteristics. A figure of merit, static VpiL, as low as 0.24Vmm is achieved. The effect of carrier lifetime variation with doping concentration is explored and found to be important for the modulator characteristics.
READ LESS

Summary

We present a systematic study of Mach-Zehnder silicon optical modulators based on carrier-injection. Detailed comparisons between modeling and measurement results are made with good agreement obtained for both DC and AC characteristics. A figure of merit, static VpiL, as low as 0.24Vmm is achieved. The effect of carrier lifetime variation...

READ MORE

Organometallic vapor phase epitaxy of relaxed InPAs/InP as multiplication layers for avalanche photodiodes

Published in:
J. Cryst. Growth, Vol. 310, No. 7-9, April 2008, pp. 1583-1589 (Proc. 13th Int. Conf. on Crystal Growth, in conjunction with Int. Conf. on Vapor Growth and Epitaxy and US Biennial Workshop on Organometallic Vapor Phase Epitaxy, 12-17 August 2007).
Topic:

Summary

InP1-yAsy epitaxial layers grown lattice-mismatched (LMM) on InP substrates were investigated as a new materials system for multiplication layers in Geiger-mode avalanche photodiodes (GM APDs) for detection of photons in the range 1.6-2.5 mm. LMM InP1-yAsy epilayers were grown on semi-insulating (1 0 0) InP substrates misoriented 0.2 and 2 [1 1 0] by organometallic vapor phase epitaxy at a growth temperature of 580 1C. The growth scheme used for the InP1-yAsy buffer layer was optimized based on surface step structure and X-ray diffraction. It was found that step-flow growth is a minimum criterion for obtaining good material quality. A narrower XRD full-width at half-maximum values were measured for 21-miscut substrates compared to 0.21-miscut substrates. A highquality buffer was obtained by step-grading the InP1-yAsy composition in increments of y = 0.05 over a layer thickness of 0.5 mm to a final y = 0.25. The device performance of LMM GM APDs was compared to that of measured more traditional lattice-matched GaSbbased devices. At 77 K, dark count rates of LMM devices are ~50 kHz at 5V overbias, and are comparable to GaSb-based p-i-n diodes operated in Geiger mode, while reset times of 0.02 ms are approximately 3 orders of magnitude lower than GaSb-based GM APDs.
READ LESS

Summary

InP1-yAsy epitaxial layers grown lattice-mismatched (LMM) on InP substrates were investigated as a new materials system for multiplication layers in Geiger-mode avalanche photodiodes (GM APDs) for detection of photons in the range 1.6-2.5 mm. LMM InP1-yAsy epilayers were grown on semi-insulating (1 0 0) InP substrates misoriented 0.2 and 2...

READ MORE

Experimental demonstration of remote optical detection of trace explosives.

Published in:
SPIE Vol. 6954, Chemical, Biologica, Radiological, Nuclear and Explosives (CBRNE) Sensing IX, 18-20 March 2008, 695407.

Summary

MIT Lincoln Laboratory has developed a concept that could enable remote (10s of meters) detection of trace explosives' residues via a field-portable laser system. The technique relies upon laser-induced photodissociation of nitro-bearing explosives into vibrationally excited nitric oxide (NO) fragments. Subsequent optical probing of the first vibrationally excited state at 236 nm yields narrowband fluorescence at the shorter wavelength of 226 nm. With proper optical filtering, these photons provide a highly sensitive explosives signature that is not susceptible to interference from traditional optical clutter sources (e.g., red-shifted fluorescence). Quantitative measurements of trace residues of TNT have been performed demonstrating this technique using a breadboard system, which relies upon a pulsed optical parametric oscillator (OPO) based laser. Based on these results, performance projections for a fieldable system are made.
READ LESS

Summary

MIT Lincoln Laboratory has developed a concept that could enable remote (10s of meters) detection of trace explosives' residues via a field-portable laser system. The technique relies upon laser-induced photodissociation of nitro-bearing explosives into vibrationally excited nitric oxide (NO) fragments. Subsequent optical probing of the first vibrationally excited state at...

READ MORE

Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography

Published in:
SPIE Vol. 6924, Optical Microlithography XXI, 26-27 February 2008, pp. 69244R.

Summary

To enable development of novel signal processing circuits, a high-speed surface-channel charge coupled device (CCD) process has been co-integrated with the Lincoln Laboratory 180-nm RF fully depleted silicon-on-insulator (FDSOI) CMOS technology. The CCDs support charge transfer clock speeds in excess of 1 GHz while maintaining high charge transfer efficiency (CTE). Both the CCD and CMOS gates are formed using a single-poly process, with CCD gates isolated by a narrow phase-shift-defined gap. CTE is strongly dependent on tight control of the gap critical dimension (CD). In this paper we review the tradeoffs encountered in the co-integration of the CCD and CMOS technologies. The effect of partial coherence on gap resolution and pattern fidelity is discussed. The impact of asymmetric bias due to phase error and phase shift mask (PSM) sidewall effects is presented, along with adopted mitigation strategies. Issues relating to CMOS pattern fidelity and CD control in the double patterning process are also discussed. Since some signal processing CCD structures involve two-dimensional transfer paths, many required geometries present phase compliance and trim engineering challenges. Approaches for implementing noncompliant geometries, such as T shapes, are described, and the impact of various techniques on electrical performance is discussed.
READ LESS

Summary

To enable development of novel signal processing circuits, a high-speed surface-channel charge coupled device (CCD) process has been co-integrated with the Lincoln Laboratory 180-nm RF fully depleted silicon-on-insulator (FDSOI) CMOS technology. The CCDs support charge transfer clock speeds in excess of 1 GHz while maintaining high charge transfer efficiency (CTE)...

READ MORE